TSMC Details High-NA EUV Strategy and Costs

TSMC CEO C.C. Wei confirms the purchase of ASML High-NA EUV systems for R&D while outlining production plans through 2029.

At a shareholder meeting in Taiwan, TSMC CEO C.C. Wei confirmed the company has purchased High-NA EUV systems from ASML for research and development. While each system costs approximately 400 million euros, TSMC stated in April 2026 that it will not use High-NA for its A13 and A12 processes planned for 2029. This approach differs from Intel, an initial customer with at least two systems in use, which plans to begin series production at the Intel 14A stage. Other competitors, including Samsung and SK Hynix, have also secured at least one High-NA EUV system each. TSMC continues to evaluate the technology's role in its roadmap as the industry navigates the high capital requirements of ASML's latest lithography equipment.