ASML to Raise Low-NA EUV Scanner Prices by 2028

ASML CFO Roger Dassen confirms plans for value-based price increases on Low-NA EUV tools starting in 2028, impacting major clients like TSMC.

ASML is moving toward a value-based pricing strategy for its Low-NA EUV lithography tools, with price adjustments scheduled to begin in 2028. CFO Roger Dassen stated the company aims to align costs with the value provided by machines like the TWINSCAN NXE:3800E for 2nm nodes, the NXE:3600D for 3nm and 5nm, and the NXE:3400C for 5nm and 7nm processes. Productivity improvements often stem from software managed by ASML’s Installed Base Management unit, which focuses on maintaining and improving existing machines. While TSMC, Taiwan’s largest semiconductor manufacturer, is reportedly unhappy with the planned price adjustments, there is currently no alternative source for EUV scanners capable of performing these specific manufacturing tasks. ASML continues to leverage its position as the sole provider of these essential tools while focusing on software-driven gains for its installed base.