ASML and Intel Reach High-NA-EUV Series Readiness

ASML reports revenue growth to 9.3 billion euros as Intel begins using High-NA-EUV lithography for its next-generation Panther Lake chips.

ASML has reported a significant quarterly revenue increase from 7.7 billion to 9.3 billion euros, with profits rising to 2.9 billion euros. Alongside Intel, the company declared series readiness for High-NA-EUV lithography systems. Intel is currently utilizing these systems, including EXE:5000 and EXE:5200 models at its Oregon R&D facility, to produce selected layers of Intel 18A Panther Lake chips and a subset of Core Ultra Series 3 processors. Yields for High-NA-EUV are reportedly comparable to Low-EUV levels. Looking ahead, ASML expects 2026 memory sector revenue to grow by 75 percent and Q3 2026 revenues to reach 12 billion euros. While China sales are falling to 13 percent, ASML is scaling production, targeting 65 Low-NA-EUV and 130 DUV systems. Capacity plans include 85 EUV systems in 2027 and 110 systems by 2028.